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This handbook covers the fundamental aspects of reactive magnetron sputter deposition. This so-called physical vapor deposition technique is used to grow compound thin films. The books starts with an explanation of the four title words. Using a simple model several aspects of the deposition technique are introduced. In the following chapters the book introduces a more complete mode to address some specific features of reactive sputter deposition. Finally, some important points related to thin film growth are introduced and illustrated.

This handbook covers the fundamental aspects of reactive magnetron sputter deposition. This so-called physical vapor deposition technique is used to grow compound thin films. The books starts with an explanation of the four title words. Using a simple model several aspects of the deposition technique are introduced. In the following chapters the book introduces a more complete mode to address some specific features of reactive sputter deposition. Finally, some important points related to thin film growth are introduced and illustrated.

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High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.Includes a comprehensive description of the HiPIMS process from fundamental physics to applicationsProvides a distinctive link between the process plasma and thin film communitiesDiscusses the industrialization of HiPIMS and its real world applications

Book is in Used-VeryGood condition. Pages and cover are clean and intact. Used items may not include supplementary materials such as CDs or access codes. May show signs of minor shelf wear and contain very limited notes and highlighting. 1.1

Microwave tubes are vacuum electron devices used for the generation and amplification of radio frequencies in the microwave range. An established technology area, the use of tubes remains essential in the field today for high-power applications. The culmination of the author's 50 years of industry experience, this authoritative resource offers you a thorough understanding of the operations and major classes of microwave tubes. Minimizing the use of advanced mathematics, the book places emphasis on clear qualitative explanations of phenomena. This practical reference serves as an excellent introduction for newcomers to the field and offers established tube engineers a comprehensive refresher. Professionals find coverage of all major tube classifications, including klystrons, traveling wave tubes (TWTs), magnetrons, cross field amplifiers, and gyrotrons.

Microwave tubes are vacuum electron devices used for the generation and amplification of radio frequencies in the microwave range. An established technology area, the use of tubes remains essential in the field today for high-power applications. The culmination of the author's 50 years of industry experience, this authoritative resource offers you a thorough understanding of the operations and major classes of microwave tubes. Minimizing the use of advanced mathematics, the book places emphasis on clear qualitative explanations of phenomena. This practical reference serves as an excellent introduction for newcomers to the field and offers established tube engineers a comprehensive refresher. Professionals find coverage of all major tube classifications, including klystrons, traveling wave tubes (TWTs), magnetrons, cross field amplifiers, and gyrotrons.

The high voltage power supply for magnetron, used for the modular microwave generators in industrial applications, is a classical design. This system is composed of a single-phase high voltage transformer with shunts supplying a cell, composed of a capacitor and a diode, which doubles the voltage and stabilizes the current. In this case, the leakage fluxes in the magnetic shunts are of the same order in the primary and the secondary fluxes. In this work, a π quadruple model of this leakage transformer is developed taking account the saturation phenomena and the stabilization of the magnetron current. From the model of the transformer we will define a strategy of optimization aims at restricting the study of the effect of simultaneous variation of pertinent parameters on the magnetron current. This will lead to find an optimized solution of the transformer. The later, with reduced volume, weight, and therefore cost, will make the power supply more economical.

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.Includes a comprehensive description of the HiPIMS process from fundamental physics to applicationsProvides a distinctive link between the process plasma and thin film communitiesDiscusses the industrialization of HiPIMS and its real world applications

Diamond-like carbon (DLC) is an amorphous allotrope of carbon showing intermediate electric (graphitic) and mechanical (diamond) properties. DLC thin films are usually prepared by magnetron sputtering and plasma-enhanced chemical vapour deposition. For some applications, it is necessary to deposit DLC coatings with modified properties. One process consists in adding metal atoms into the amorphous DLC matrix. Moreover, the use of pulsed power supplies is becoming dominant in the industrial production of hard coatings. In this work, DLC and metal-DLC films were deposited by pulsed plasma technology and showed modulated surface properties. The production of DLC with modified nanostructure is adequate for applications requiring advanced functionality coatings: cutting tools, sensors and devices, optical systems and biomedical implants assure the versatility of this material.

Diamond-like carbon (DLC) is an amorphous allotrope of carbon showing intermediate electric (graphitic) and mechanical (diamond) properties. DLC thin films are usually prepared by magnetron sputtering and plasma-enhanced chemical vapour deposition. For some applications, it is necessary to deposit DLC coatings with modified properties. One process consists in adding metal atoms into the amorphous DLC matrix. Moreover, the use of pulsed power supplies is becoming dominant in the industrial production of hard coatings. In this work, DLC and metal-DLC films were deposited by pulsed plasma technology and showed modulated surface properties. The production of DLC with modified nanostructure is adequate for applications requiring advanced functionality coatings: cutting tools, sensors and devices, optical systems and biomedical implants assure the versatility of this material.

Raytheon’s history is one of the great American success stories. Launched in 1922, theCambridge-based company quickly moved to the forefront of innovation in the electronics industry. During World War II, thousands of Raytheon workers contributed to the war effort, supplying eighty percent of the magnetron tubes (vital components for U.S. and British radars), developing miniature tubes for the crucial proximity fuse in antiaircraft shells, and providing entire radar systems. Although government contracts slowed after World War II, Raytheon continued to develop military components, including leading-edge radars and missiles for America’s defenses in the Cold War, but it also began to offer a host of civilian products: the famous RadaRange (the world’s first microwave oven), televisions, marine radars, transistors, miniature hearing aids, and medical equipment.

In this book we have discussed the preparation and characterization of pure ZnO thin films using RF magnetron sputtering technique.The deposition parameters such as substrate temperature and film thickness are optimized for producing good quality films.Systematic characterization of as deposited and annealed films has been discussed from the crystal structure,surface morphology,film composition,optical and electrical properties.The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.

Late in 1939 Nazi Germany was poised to overrun Europe and extend Adolf Hitler’s fascist control. At the same time, however, two British physicists invented the resonant cavity magnetron. About the size of a hockey puck, it unlocked the enormous potential of radar exclusively for the Allies. Since the discovery of radar early in the twentieth century, development across most of the world had progressed only incrementally. Germany and Japan had radar as well, but in just three years, the Allies’ new radar, incorporating the top-secret cavity magnetron, turned the tide of war from doubtful to a known conclusion before the enemy even figured out how. The tactical difference between the enemy’s primitive radar and the Allies’ new radar was similar to that between a musket and a rifle. The cavity magnetron proved to be the single most influential new invention contributing to winning the war in Europe. Norman Fine tells the relatively unknown story of radar’s transformation from a technical curiosity to a previously unimaginable offensive weapon. We meet scientists and warriors critical to the story of radar and its pressure-filled development and implementation. Blind Bombing brings to light two characters who played an integral role in the story as it unfolded: one, a brilliant and opinionated scientist, the other, an easygoing twenty-one-year-old caught up in the peacetime draft. This unlikely pair and a handful of their cohorts pioneered a revolution in warfare. They formulated new offensive tactics by trying, failing, and persevering, ultimately overcoming the naysayers and obstructionists on their own side and finally the enemy.  

In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.

HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions.

Raytheon's history is one of the great American success stories. Launched in 1922, the Cambridge-based company quickly moved to the forefront of innovation in the electronics industry. During World War II, thousands of Raytheon workers contributed to the war effort, supplying eighty percent of the magnetron tubes (vital components for U.S. and British radars), developing miniature tubes for the crucial proximity fuse in antiaircraft shells, and providing entire radar systems. Although government contracts slowed after World War II, Raytheon continued to develop military components, including leading-edge radars and missiles for America's defenses in the Cold War, but it also began to offer a host of civilian products: the famous RadaRange (the world's first microwave oven), televisions, marine radars, transistors, miniature hearing aids, and medical equipment.

This item is printed on demand - it takes 3-4 days longer - Neuware -The low cost and low temperature electrochemical deposition technique was employed to grow Cu2O thin films and ZnO:Al thin films were deposited by d.c. magnetron sputtering in order to fabricate solar cells. The potentiostatic and galvanostatic electrodeposition modes were used to deposit the Cu2O thin films. Raman spectra of thin films have shown characteristic frequencies of crystalline Cu2O. The contact between Cu2O and Au is found to be an Ohmic contact. The devices grown by a potentiostatic mode have higher efficiency than those grown by a galvanostatic mode. The optimum thickness of Cu2O thin films as an absorber layer in solar cells. was found to be around 3 µm respect to a high efficiency. Flexible and light weight solar cell was fabricated on plastic substrate. 130 pp. Englisch